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FPD Technology

Process to coat the glass substrate Process to coat the glass substrate
In FPD technology, Process of Coating for Glass Substrate and/or CF is an extremely important process. KURAMOTO's "Coating technology" enjoy a high reputation of customers.

This process is to undershirt film for Soda Lime Glass for STN. The process is used to prevent fusing alkali ingredients such as sodium ion out of glass substrates.
It is also effective to strengthen adhesion of thin film to glass.
KURAMOTO uses sputtering method.
Thickness Customers' Specifications
Transparency Customers' Specifications

Undercoating by Dip Method [Low-Resistance ITO Film]
ITO Film is used as Transparent Electrode to control crystal substance. The ITO is the abbreviation of Indium Tin Oxide.
It is important for ITO for Transparent Electrode for LCD to have a higher optical transmittance under a lower resistance.
KURAMOTO has achieved resistivity of 1.2x10-4 ohm-cm ITO Film that is the highest specification in the mass production.
Low-Resistance ITO Film (an example)
Thickness 240nm
Resistivity Less than 5.0Ω/sq.
Optical Transmittance More than 80% ( λ=550nm)

[ITO Film Coating on CF substrate]
ITO Film on CF Substrate used as Transparent Common Electrode by the side of CF.
This process is to coat under low temperature ITO Film on the patterned CF after masking by a thin metal mask on it.
We have realized an ITO Film on CF that enjoys non-defects, high adhesion strength and equalized resistivity by means of continuous coating process in combination with CF Special Surface Treatment as KURAMOTO original technology.
ITO Film Coating on CF substrate(an example)
Resistivity Less than 30Ω/sq.
Optical Transmittance?? 95±3% ( λ=550nm)

[High Transparent ITO Film for Touch Panel]
ITO Film for Touch Panels of Resistance Film Method.
Many of present Touch Panels are made under Resistance Film Method that requires high transparence and high and equalized resistivity.

[Flat and Smooth Surface ITO Film for OLED]
ITO Film for the Anode Electrode of Organic Electroluminescence Display. OLED piles Hole Transport Layer, Emitting Layer, Electron Transport Layer and Cathode Layer on ITO Film Anode Layer.
If there are some roughness on the ITO Film, electric charge will be concentrated on the portion (over-current occurs) and the concentration causes some troubles such as Dark Spot.
KURAMOTO has realized a flat, smooth and non-defects ITO Film making much use of technologies of Low-resistance ITO Film and Precision Surface Polishing Technology that can be applicable for the use of ITO Film for OELD.
Flat and Smooth Surface ITO Film for OLED
Ra Roughness Less than 1nm

[Super Low-Reflection Metal Film]
Super Low-reflection Metal Film is a black film used as a CF Black Matrix. The material is made of Chromium (Cr.).
BM hems each dot of RGB (Color Elements of Red, Green and Blue) like a window frame and prevents optical leak (shading). It is also useful for a realization of contrast improvement and prevention of color mixture in the production process.
Lower reflectance, darker color close by pure black and shorter etching time are required.
KURAMOTO are producing various kinds of metal films from Pure Cr Film to Multilayer Super Low-reflection Film.
Super Low-Reflection Metal Film
Optical density More than 3.8
Luminous reflectance Less than 1.0

[New Metal Film]
This is a black film also used for CF Black Matrix. The substances of the film are developed by KURAMOTO as KURAMOTO Original Metal. (KURAMOTO Patent) In compliance with the global growing campaign for environmental preservation and maintenance, KURAMOTO has developed the environment friendly New Metal Film.
New Metal Film
Optical density More than 3.8
Luminous reflectance Less than 3.0

[High-Reflection Ag alloy Metal Film]
We have developed a new Ag Alloy Reflection Film for Reflection Type LCD for mobile appliance such as cellular phone, PDA and so on. By doping Au, we have made it possible to improve reflection characteristics in the visible area (450nm - 700nm) and to widen the flat area. As the result,
the reflection uniformity is improved to pulling out Color Filter Design Characteristics. In addition to the above, the newly developed Reflection Film has realized a high adhesion strength without under coating and has a high anti-alkali characteristics with due tolerance in the patterning process.
High-Reflection Ag alloy Metal Film
Reflectance more than 90%(λ =400 - 700nm)
Efficiency Alkali-Resistance less than 10%(75°C - 5wt%NaOH,30min)

[Low-Resistance Ag alloy Metal Film for Electrode]
We have developed a new Ag alloy Electrode Film for PDP and OLED.
It is without saying that the demands for a low electricity consumption is a key factor aimed for.
We have achieved resistivity of 4.0 X 10-6Ω·cm by adding a metal oxide to Ag.
In addition to the above, the Ag Alloy Electrode Film enjoys the advantages of high adhesion strength and high anti-alkali characteristics as Ag Alloy Reflection Film.
Low-Resistance Ag alloy Metal Film for Electrode
Resistivity 4.0 X 10-6Ω·cm
Efficiency Alkali-Resistance less than 5%(75°C - 5wt%NaOH,30min)



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